Semiconductor Technology

The Semiconductor Technology Track focuses on two key areas essential for the continued scaling of semiconductor systems: BEOL interconnect technologies and chiplet technologies. With the limitations of copper (Cu) wiring, the industry is exploring faster, more energy-efficient alternatives, including elemental metals, intermetallics, anisotropic compounds, and topological semimetals. Research in this area includes both experimental work on material development and theoretical studies using AI/ML and simulations to improve interconnect performance. Additionally, chiplet technology research aims to improve system performance through advanced chiplet design, 3D integration, hybrid bonding, and innovations in packaging, cooling, and power delivery. Projects may also explore other semiconductor advancements, such as resistive switching devices, AI-driven inspection, and device-level simulations.

Projects

2025

Project RPI Principal Investigators IBM Principal Investigators
High resolution x-ray imaging for 3D-HI chiplet non-destructive internal metal joints inspection Edwin Fohtung, James Lu Roy Yu, Katsuyuki Sakuma
E-beam glancing angle scattering for hybrid bonding surface planarity measurement Gwo-Ching Wang, Toh-Ming Lu Nicholas Polomoff, Katsuyuki Sakuma
Intermetallic compounds for high-conductivity interconnects Daniel Gall Atharv Jog, Ching-Tzu Chen, Nargess Arabchi
Control of orientation and handedness of nanoscale topological and directional interconnect conductors on amorphous SiO2 Jian Shi, Ravishankar Sundararaman Ching-Tzu Chen, Fausto Martelli
Discovering topological materials for BEOL interconnects using first-principles calculations and machine learning Trevor David Rhone, Ravishankar Sundararaman Ching-Tzu Chen, Dmitry Zubarev, Timothy Philip
Validation of multiscale 3D chiplet stack thermal model with temperature-dependent materials through 3w measurements Jacob Merson, Max Bloomfield Roy Yu, Timothy Chainer, Prabudhya Roy Chowdhury, Aakrati Jain, Mukta Farooq
Molecular engineering of metal/low-k interfaces for Cu interconnects Ganpati Ramanath, Pawel Keblinski Dan Edelstein
Meta-Learned Digital Twins for Circuit Design in Chiplet Integration Tianyi Chen, Mona Hella Cheng Chi, Songtao Lu, Xin Zhang, Shawn Pinkett

2026

Project RPI Principal Investigators IBM Principal Investigators
Glancing electron diffraction study of Cu pads surface texture for hybrid bonding Gwo-Ching Wang, Toh-Ming Lu Roy Yu, Katsuyuki Sakuma
Discovering topological materials for BEOL interconnects using first-principles calculations and machine learning Ravishankar Sundaraman Ching-Tzu Chen, Dmitry Zubarev, Timothy Philip
New materials for high-conductivity interconnects Daniel Gall Atharv Jog, Nargess Arabchi, Ching-Tzu Chen
High-Resolution X-ray Imaging for 3D-HI Chiplet Non-Destructive Internal Metal Joints Inspection Edwin Fohtung, James Lu Nick Polomoff, Roy Yu, Katsuyuki Sakuma
Molecularly engineered liner/low-k interfaces and linerless Cu interconnects Ramanath Ganpati, Pawel Keblinski Dan Edelstein
Control of orientation and handedness of nanoscale Weyl interconnects metals on amorphous SiO2 Jian Shi, Ravishankar Sundararaman Ching-Tzu Chen, Thanh Nguyen
Computation-Guided Discovery of High-Thermal Conductivity, Low-k Dielectrics for Advanced Node Technologies Prashun Gorai, Nikhil Koratkar, Theo Borca-Tasciuc Prabudhya Roy Chowdhury, Aakrati Jain, Son Nguyen
Validation of size dependent and interface resistance models with 3 measurements Jacob Merson, Max Bloomfield, Theodorian Borca-Tasciuc Timothy Chainer, Aakrati Jain, Prabudhya Roy Chowdhury, Dureseti Chidambarrao

2024

Project RPI Principal Investigators IBM Principal Investigators
Molecular nanoengineering of post-Cu-metal/dielectric interfaces for nanodevice wiring Ganpati Ramanath, Pawel Keblinski, Ravishankar Sundararaman Griselda Bonilla, Ching-tzu Chen, Atharv Jog
Intermetallic compounds for high-conductivity interconnects Daniel Gall Atharv Jog, Ching-Tzu Chen
E-beam glancing angle scattering for hybrid bonding surface planarity measurement Gwo-Ching Wang, Toh-Ming Lu Nicholas Polomoff, Katsuyuki Sakuma
High resolution x-ray imaging for 3D-HI chiplet non-destructive internal metal joints inspection Edwin Fohtung, James Lu Roy Yu, Katsuyuki Sakuma
Anisotropic Thermal Resistance Characterization of SI, BEOL, and underfill layers using 3 omega Joule heating thermometry and exploratory non-destructive scanning Thermal Microscopy/ Multiscale Thermal Modeling of 3D ICs Theo Borca-Tasciuc, Jacob Merson, Max Bloomfield Roy Yu, Timothy Chainer, Prabudhya Roy Chowdhury, Aakrati Jain, Mukta Farooq
Control of orientation and handedness of nanoscale topological interconnect conductors on amorphous SiO2 Jian Shi, Ravishankar Sundar Ching-tzu Chen
Discovering topological materials for BEOL Interconnects using first-principles calculations and machine learning Trevor Rhone, Ravishankar Sundar Ching-tzu Chen, Atharv Jog
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